RF Plasma Source (XHS‑RFIS)
RF-coupled, compact, customizable power/frequency for research and process use.
RF Ion Source XHS‑RFIS
Modular RF-coupled ion source, low contamination, easy integration
RF/ICP-based source with no DC electrodes, compact and easy to maintain. Supports multiple gases for materials processing and plasma chemistry, or as a lab/process ion source; integrates well with diagnostics for beam/density calibration.
Key Features
- RF coupling without DC electrodes for low contamination and easy upkeep
- Supports Ar/He/N₂ and more with easy tuning
- Compact form with configurable power/frequency and cooling options
- Easy pairing with probes/Faraday/RPA for beam diagnostics
Key Specifications
| Item | Specification |
|---|---|
| Drive | RF coupling () |
| Frequency/Power | 13.56 MHz (or custom) / configurable power |
| Gases | Ar / He / N₂ etc. |
| Interfaces | KF / CF / custom flanges |