感知诊断监测SENSEDIAGNOSEMONITOR

Products & Services

Contact Diagnostics

Directly place probes in plasma to measure core parameters.

XHINS-LP Langmuir Probe Products

Automated I–V scans for core parameters; supports single/double/triple/emissive probes.

  • Electron density (nen_e), ion density (nin_i)
  • Electron temperature (TeT_e)
  • Plasma potential (VpV_p), floating potential (VfV_f), electron energy distribution function (EEDF)

XHINS-FP Faraday Probe / Faraday Cup

Measures the spatial distribution of ion current density with a probe scan. The data also give total ion current, beam uniformity, and beam divergence. For a pulsed ion source, a known flight path, calibrated time zero, and fast acquisition give TOF arrival-time data.

  • Spatial distribution of ion current density
  • Total ion current, beam uniformity, and divergence angle
  • Pulsed-current waveform and TOF arrival-time distribution

XHINS-EBP ExB Probe / Wien Filter / Particle Velocity Selector

Uses crossed electric and magnetic fields to filter ions by charge-to-mass ratio, precisely measuring charge-state fractions and velocity distributions for plume composition diagnostics.

  • Ion charge-state fractions (Xe⁺, Xe²⁺, Xe³⁺, etc.)
  • Ion velocity distribution (IVDF)
  • Plume impurity identification

Ion Energy Analyzer (RPA: Retarding Potential Analyzer / RFEA: Retarding Field Energy Analyzer)

The analyzer changes the retarding voltage in a selected range and records the collector current. The retarding curve gives the ion energy-per-charge spectrum. This spectrum is the primary output. For repeatable pulsed ion sources, synchronized I(t) measurements at fixed voltages give time-resolved spectra. The RPA supplies energy selection for energy-resolved TOF systems.

  • Ion energy-per-charge spectrum (E/q)
  • Retarding curve, spectral peak, and energy spread
  • Time-resolved spectra and energy selection for TOF systems
Contact Diagnostics
Product typeMain output parametersMeasurement task
Langmuir probes
Single probeIon density (nin_i), electron density (nen_e), electron temperature (TeT_e), plasma potential (VpV_p), floating potential (VfV_f), EEDFSteady parameter measurements and spatial scans in low-temperature plasmas
Double probeElectron density (nen_e), electron temperature (TeT_e)Atmospheric-pressure plasma jets, floating devices, and discharges with strong interference
Triple probeElectron density (nen_e), electron temperature (TeT_e)Time-resolved measurements of pulsed discharges and transient thruster operation
Emissive probePlasma potential (VpV_p)Plasma-potential measurements in sheaths, near-wall regions, and thruster plumes
Other plasma probes
Magnetic probeMagnetic field (B)Magnetic-disturbance measurements in confinement devices and field-distribution checks in thrusters
Faraday probe / Faraday cupSpatial ion current-density distribution, total ion current, and TOF arrival-time distributionThruster plume scans, beam-uniformity assessments, and pulsed-ion-source TOF measurements
Ion-beam composition and energy analyzers
ExB probe / Wien filter / particle velocity selectorRelative fractions of ion charge states, ion velocity distribution, and plume impurity identificationCharge-state, velocity-distribution, and composition measurements in electric-propulsion plumes
Ion energy analyzer (RPA / RFEA)Retarding curve, ion energy-per-charge spectrum (E/q), and collected ion currentRetarding-voltage scans for ion energy-per-charge spectra, energy-spread analysis, time-resolved spectra, and energy selection for TOF systems

Optical Diagnostics

Remote measurements via spontaneous emission and light–matter interaction with high selectivity and spatiotemporal resolution.

Optical Diagnostics
MethodDiagnostic resultsMeasurement task
Spectroscopy & laser diagnostics
Optical Emission Spectroscopy (OES)Emitting species; model estimates of excitation temperature, electron temperature, and relative densityDischarge-state and uniformity monitoring; process endpoint detection
Laser-Induced Fluorescence (LIF)Target-particle density (with calibration), velocity distribution (VDF / IVDF), and temperatureThruster plume velocity fields and trace-particle diagnostics
Thomson ScatteringElectron temperature (TeT_e) and electron density (nen_e)Electron-parameter measurements in laboratory plasmas and magnetic-confinement devices

Plasma Sources

Stable, controllable ion beam assemblies for labs, EP ground systems, and etch/material lines; includes beam conditioning, grid optics, and neutralizer options.

Plasma Sources
TypeKey parametersUses and test environments
Kaufman ion source
Operating principle
Hot cathode / DC discharge
Ion energy (eV)
50 – 1500 (widely tunable)
Suitable propellants
Ar, Xe, N₂ (inert/reactive)
Neutralizer
Required (hot cathode)
Main use
Ion beam sputtering, materials modification
Application
Ground EP, etch/coating
Hall source
Operating principle
E×B closed-loop discharge
Ion energy (eV)
150 – 600 (medium)
Suitable propellants
Xe, Kr, Ar
Neutralizer
Required (hollow cathode)
Main use
Space propulsion, surface treatment
Application
EP lifetime/performance tests
Cathodic arc source
Operating principle
Vacuum arc discharge
Ion energy (eV)
~50 – 200 (multiply charged)
Suitable propellants
Metals (Ti, C, Cu, etc.)
Neutralizer
Self-neutralized (plasma)
Main use
Hard coatings (TiN), thin film deposition
Application
Materials, surface engineering
XHINS-RF Series RF Plasma Source System (RF/ICP)
Operating principle
Inductively coupled discharge
Ion energy (eV)
< 100 (low)
Suitable propellants
Ar, O₂, N₂, H₂
Neutralizer
Optional (grid extraction)
Main use
Semiconductor etching, cleaning, assisted deposition
Application
Wafer etching, wafer cleaning, and material tests that require low surface damage
XHINS-ECR ECR Plasma Source Systems
Operating principle
Electron cyclotron resonance
Ion energy (eV)
10 – 2000+ (wide range)
Suitable propellants
Ar, O₂, N₂, multiply charged ions
Neutralizer
Optional (grid extraction)
Main use
Multiply charged plasma source, space propulsion, injection
Application
Multiply charged beams for fundamental research facilities, specialty ion excitation in propulsion/etching experiments

Micro Thrust Stands

Deliverable thrust stands for low-thrust thrusters and plasma sources, including platform, calibration tools, and test software for vacuum and long-duration runs.

Micro Thrust Stands
Product or moduleMain specification or functionMeasurement task
Thrust Stand Platforms
Torsion balance thrust standThrust range: 1 μN–100 mN (customizable); resolution depends on the range and readout chainSteady and slowly varying thrust measurements and in-vacuum thrust calibration
Electromagnetic balance standThrust range: 10 μN–1 N (customizable); electromagnetic or electrostatic closed-loop force feedbackSteady thrust measurements of Hall and ion thrusters; impulse measurements of pulsed thrusters
Calibration, Readout, and Data Processing
Displacement or force readout moduleLaser-interferometer or grating-displacement readout; low-noise instrumentation amplifierCollects displacement or force-sensor signals for thrust calculations and dynamic analysis
Automated operation softwareDigital filtering, thermal-drift correction, impulse calculation, and GUM measurement-uncertainty evaluationGives thrust curves, statistical results, and measurement-uncertainty reports
Experimental Environment & Adaptation
Vacuum & propellant supportVacuum system and Xe, Ar, and Kr storage and supply moduleGround tests of thrusters and vacuum tests of plasma sources
Mounting & flange adaptationCustom mounting fixtures, interface adapters, and interlock interfacesConnection to existing vacuum chambers or plasma test platforms